Plasma Impulse Chemical Vapor Deposition (PICVD) is a unique technology developed by Auer Lighting. The combination of a CVD process with plasma impulses open a wide range of applications:

• Coatings on inner and outer surfaces of inorganic (glass, glass-ceramics, ceramics, metal) and organic (plastics) substrates in flat or 3D shape are possible  
  
  
• Filters, mirrors, functional and decorative coatings

• Cost efficient with high deposition rates
• Piece-by-piece coating resulting high yield
• Reliable process
• Clean without clean room
• Automated